For removing exposed resist during the positive photofabrication process.

  • Disolves exposed photoresist
  • Concentrated formulation - dilute one part developer to ten parts water
  • For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
  • Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .


Catalog Number Sizes Available Description
418-500ML 500 mL (17 fl. oz) Liquid

Safety Data Sheet
Technical Data Sheet