For removing exposed resist during the positive photofabrication process.
- Disolves exposed photoresist
- Concentrated formulation - dilute one part developer to ten parts water
- For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
- Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .
|Catalog Number||Sizes Available||Description|
||475 mL (16 fl. oz)
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