RoHS Compliant

Positive Developer

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  • Description
  • MSDS
  • Resources

For removing exposed resist during the positive photofabrication process.

  • Disolves exposed photoresist
  • Concentrated formulation - dilute one part developer to ten parts water
  • For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
  • Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .

Available Sizes

Catalog NumberSizes AvailableDescription
418-500ML 475 mL (16 fl. oz) Liquid

Available MSDS:


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